Pastry Chef de Partie - All-Day Dining Restaurant

About the role

Luura Paros Cliff, a luxury hotel in Paros, is looking for a Pastry Chef de Partie for LENEA, its all-day dining restaurant. Working under the guidance of the Pastry Chef and in line with the LUURA/RIKAS concept, the role supports the pastry operation and ensures high-quality pastry items are prepared and presented throughout the day, with a strong focus on breakfast.

Key responsibilities

• Manage the production and presentation of each item according to menu needs, following company standards, policies and procedures.
• Follow the recipes and preparations set by the Pastry Chef and the company.
• Lead, guide and supervise on-site pastry teams on technique, presentation and efficiency.
• Organise regular training for pastry staff on techniques, hygiene, customer service and safety.
• Ensure daily production standards, including scheduling, peak-hour coverage and quality control through tasting sessions.
• Monitor inventory, order materials, receive products and manage cost and waste of supplies.
• Maintain hygiene, safety and compliance standards and collaborate with F&B, reception and events departments.
• Oversee storage, handling and rotation of ingredients and finished products, and prepare reports for senior management.

Required profile

• 5+ years of experience in fine dining or luxury hospitality pastry operations.
• Pre-opening experience, ideally launching new outlets or properties.
• Ability to develop seasonal and signature desserts and to train and mentor a brigade of pastry staff.
• Strong communication skills and ability to work in a fast-paced, high-end environment.
• Eligible to work in an EU country; English is a must, additional languages are a plus.

What we offer

• Team rates at LUURA, Ennismore and Accor properties worldwide.
• Discounts at restaurants, bars and cafes.
• Access to art, cultural events and live music nights.
• Recognition such as surprise gifts and team celebrations.
• Team spaces and comfortable accommodation where applicable.